Method and apparatus for filling a gap between spaced layers of a semiconductor

ABSTRACT

A semiconductor device assembly with a gap to be filled has thermal vias formed in the supporting substrate. After the semiconductor device is connected to the substrate and fill material positioned about the gap to create a seal, a vacuum is drawn through the thermal vias and a pressure applied to the fill material to urge the fill material into the interior of the gap.

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application is a continuation of application Ser. No.09/944,502, filed Aug. 30, 2001, pending, which is a continuation ofapplication Ser. No. 09/651,393, filed Aug. 29, 2000, now U.S. Pat. No.6,325,606 B1, issued Dec. 4, 2001, which is a continuation ofapplication Ser. No. 09/208,679, filed Dec. 10, 1998, now U.S. Pat. No.6,179,598 B1, issued Jan. 30, 2001, which is a divisional of applicationSer. No. 08/789,269, filed Jan. 28, 1997, now U.S. Pat. No. 5,866,442,issued Feb. 2, 1999.

BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] This invention relates to a method and apparatus for underfillingthe gap between a semiconductor device mounted on a substrate, such as aflip chip semiconductor device mounted on a substrate.

[0004] 2. State of the Art

[0005] A flip chip semiconductor device mounted on a substrate is onetype of arrangement having a gap formed between the flip chipsemiconductor device and the substrate. A semiconductor device is saidto be a “flip chip” because it is manufactured in wafer form having itsactive surface having, in turn, bond pads thereon initially facingupwardly. After manufacture is completed and the semiconductor devicesingulated from the wafer, it is “flipped” over such that the activeinterior surface faces downwardly for attachment to a substrate. Forattachment to a substrate a flip chip semiconductor device is formedhaving bumps on the bond pads of the active surface thereof which areused as electrical and mechanical connectors with the substrate. Severalmaterials may be used to form the bumps on the flip chip semiconductordevice, such as various types of solder and alloys thereof, conductivepolymers, etc. In applications using solder bumps, the solder bumps arereflowed to form a solder joint between the flip chip semiconductordevice and the substrate. The solder joint thereby forming both theelectrical and mechanical connections between the semiconductor deviceand the substrate. Because of the presence of the bumps, a gap is formedbetween the semiconductor device and the substrate.

[0006] Since the semiconductor device and the substrate are typicallyformed of differing materials, the semiconductor device and thesubstrate have different mechanical properties with differing attendantreactions to operating conditions and mechanical loading thereby causingstress to develop in the bumps connecting the semiconductor device tothe substrate. Therefore, the bumps are typically made of sufficientrobust size to withstand such anticipated stressful conditions therebycausing a substantial gap to be created between the semiconductor deviceand the substrate. To enhance the joint integrity between thesemiconductor device and the substrate a fill material is introducedinto the gap therebetween. The fill material, called an underfillmaterial, helps equalize stress placed on the solder bumps, thesemiconductor device, and the substrate as well as helping the bumps andother electrical features of the semiconductor device and the substratebe maintained free from contaminants, including moisture, chemicals,chemical ions, etc.

[0007] In some applications, the fill material is typically dispensedinto the gap between the semiconductor device and the substrate byinjecting the fill material along one, two, or more sides with theunderfill material flowing, usually by capillary action to fill the gap.For example, U.S. Pat. No. 5,214,234 (Thompson et al.) discloses asemiconductor device assembly where an epoxy fill material is injectedaround the perimeter of the chip mated on the substrate. The epoxymaterial has a viscosity permitting it to flow into the gap. A hole maybe provided in the substrate to facilitate positioning the material intothe gap.

[0008] It has been noted that underfilling the gap by way of capillaryaction may lead to non-uniform disposition of the fill material withinthe gap. Typically, the fill material may have bubbles, air pockets orvoids. Non-uniform disposition of the material in the gap decreases thefill material's ability to protect the interconnections between thesemiconductor device and the substrate and may lead to a reduction inthe reliability of the semiconductor device.

[0009] In some arrangements, such as those disclosed in U.S. Pat. No.5,410,181 (Zollo et al.), a hole in the substrate is provided throughwhich access may be had to the circuit for performing various operationsthereon, including optical operations associated with the circuit. Aplug is positioned in the hole which precludes positioning the fillmaterial in the area associated with the plug. That is, the fillmaterial is inserted with the plug in place in the hole.

[0010] U.S. Pat. No. 5,385,869 (Liu et al.) discloses a device in whicha gap between the semiconductor device and the substrate is underfilledby forming a large hole through the substrate. The hole may even havegates or notches formed at each corner which extend beyond the hole. Theunderfill material flows through the hole by way of the gates or notchesin the substrate in order to facilitate complete underfilling.

[0011] U.S. Pat. No. 5,203,076 (Banerji et al.) teaches one to apply avacuum to evacuate air from the gap between the chip and the substrate.Air is then slowly allowed to reenter the vacuum to force the underfillmaterial into the gap between the semiconductor device and thesubstrate.

[0012] Underfilling may also be seen in the manufacture of semiconductordevices illustrated in U.S. Pat. No. 5,371,404 (Juskey et al.), U.S.Pat. No. 5,258,648 (Lin), U.S. Pat. No. 5,311,059 (Banerji et al.) andU.S. Pat. No. 5,438,219 (Kotzan et al.).

[0013] As previously stated, semiconductor devices that are underfilledor filled with a material in the gap between the semiconductor deviceand the supporting substrate frequently encounter non-uniformdisposition of the fill material. Therefore, improved underfillingmethods that improve the quality of the underfilling of the gap betweenthe flip chip type semiconductor device and the substrate, that are costeffective, and that use improved and lower cost fill materials aredesired.

BRIEF SUMMARY OF THE INVENTION

[0014] In a preferred arrangement of the invention, a semiconductordevice assembly includes a flip chip semiconductor device and asubstrate having a plurality of thermal vias therein. The flip chipsemiconductor device having a first exterior surface and having a secondactive interior surface having, in turn, bond pads thereon includingsolder bumps thereon as electrical and mechanical interconnectionstructure. The substrate comprises a substrate having a metallizedsurface pattern of electrical circuits thereon for connection with theinterconnection structure of a flip chip semiconductor device and aplurality of thermal vias extending therethrough. After theinterconnection structure of the flip chip semiconductor device isconnected to portions of the metallized surface of the substrate, a fillmaterial is used to fill the gap between the flip chip semiconductordevice and the substrate by applying a vacuum through the thermal viasin the substrate and, if desired, fluid pressure to the fill material.Preferably the fill material includes a filler.

[0015] A method of making a semiconductor device assembly comprisesproviding a semiconductor device having a first surface and a secondactive interior surface. The second active interior surface having oneor more bond pads thereon having, in turn, electrical interconnectionstructure formed thereon and extending therefrom. A substrate includesone side thereof having a metallized surface pattern of electricalcircuits thereon for contact with the electrical interconnectionstructure of the bond pads of the semiconductor device and anotherexterior surface spaced from the metallized surface. A plurality ofthermal vias extend through the substrate from the metallized surface tothe other exterior surface. The thermal vias are sized and configuredfor heat transfer from the gap adjacent the metallized surface of thesubstrate to the other exterior surface of the substrate. Thesemiconductor device is connected to portions of the metallized surfaceof the substrate having the electrical interconnection structure of thebond pads of the semiconductor device contacting the desired portions ofthe metallized surface of the substrate thereby forming a gap having aperimeter therebetween. Fill material is positioned proximate at least aportion of the perimeter of the gap between the metallized surface andthe second surface of the semiconductor device. A source of vacuum ispositioned proximate the exterior surface of the substrate relative tothe thermal vias to draw a vacuum through the thermal vias to urge thefill material into the gap.

[0016] If desired, a source of pressure may be provided and positionedto apply pressure against the fill material, in addition to the vacuum,to further urge the fill material into the gap.

[0017] Preferably, the electrical interconnection structure is aplurality of bumps formed on the second active surface of thesemiconductor device. The fill material may include suitable fillers incombination with suitable electrical insulating material. The thermalvias may be typically sized in diameter from 0.001 inches to 0.010inches.

[0018] The present invention also includes apparatus for filling the gapbetween a semiconductor device and a substrate of a semiconductor deviceassembly. The apparatus includes a supporting structure to support thesemiconductor device assembly. The semiconductor device assembly havinga first surface spaced from the second active interior surface having,in turn bond pads thereon including interconnection structure thereonthereby forming a first portion of the gap defined between thesemiconductor device and the substrate. The substrate having an internalmetallized surface pattern of electrical circuits forming a secondportion of the gap, a thickness, and an external surface. A plurality ofthermal vias are formed between the internal metallized surface and theexternal surface of the substrate. Fill apparatus is provided forpositioning fill material proximate a portion of the gap about theperimeter thereof. A pressure chamber is positioned about the externalsurface of the semiconductor device being configured to apply fluidpressure about the perimeter of the gap and against the fill material tourge the fill material into the gap.

[0019] A vacuum chamber is also positioned about the external surface ofthe substrate. The vacuum chamber is configured to draw a vacuum in thegap through the thermal vias to urge the fill material into the gap.Additionally, pressure source apparatus is preferably connected to thepressure chamber to supply fluid (e.g., gas) under pressure and tomaintain such fluid at a desired pressure. A vacuum source is connectedto the vacuum chamber to draw vacuum and to maintain the vacuum at aselected vacuum pressure.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

[0020]FIG. 1 is a simplified depiction of an apparatus used forpracticing the method of the present invention as well as asemiconductor device of the present invention;

[0021]FIG. 2 is an illustration of the exterior surface of a substrateof a semiconductor device involved in the present invention; and

[0022]FIG. 3 is a flow diagram illustrating the method of the presentinvention.

DETAILED DESCRIPTION OF THE INVENTION

[0023] Referring to drawing FIG. 1, the apparatus as well as asemiconductor device assembly 10 of the present invention areschematically illustrated.

[0024] A semiconductor device assembly 10 is shown having asemiconductor device 12 spaced from a substrate 14 to define a gap 16thereinbetween. As illustrated, the semiconductor device 12 includes abase 18 and a second active interior surface 22 having bond pads 20thereon. The semiconductor device 12 may be any suitable type flip chipsemiconductor device.

[0025] In FIG. 1, the second active interior surface 22 of thesemiconductor device 12 is shown opposite the exterior surface 24 of thebase 18. As shown, the second active interior surface 22 and exteriorsurface 24 are spaced apart, generally aligned, forming the base 18having exterior side wall 26. The base 18 may be of any suitable desiredgeometric shape and thickness.

[0026] The bond pads 20 on the second active interior surface 22 of thesemiconductor device 12 may be formed in a variety of desiredconfigurations known to those in the art. The bond pads 20 may alsoinclude various interconnection structure for connection to themetallized surface pattern of electrical circuits 28 on interior surface40 of the substrate 14. The substrate 14 may be any acceptable substrateused for mounting and receiving a semiconductor device 12 comprised ofthe base 18 having bond pads 20 and interconnecting structure thereon,such as an FR-4 type substrate board.

[0027] As illustrated, the interconnecting structure comprises aplurality of solder bumps, such as solder bumps 34 and 36, which arepositioned to contact desired locations on the metallized surfacepattern of electrical circuits 28 associated with interior surface 40 ofsubstrate 14 facing inwardly toward the gap 16.

[0028] The semiconductor device assembly 10 illustrated is a flip chipsemiconductor device which includes a semiconductor chip 12 “flipped” tohave its connective structure and, more particularly, the solder bumps34 and 36 aligned with and attached to desired connecting points of themetallized surface pattern of electrical circuits 28 of the substrate14. The solder bumps 34 and 36 are preferably flowed together using anysuitable type of heating for securing the semiconductor device 12 to themetallized surface pattern of electrical circuits 28 of the substrate14.

[0029] The substrate 14 also has an exterior surface 38 spaced from theinterior surface 40, more particularly, the metallized surface patternof electrical circuits 28, to provide a rigid substrate for supportingthe semiconductor device 12. Substrate 14 may of any suitable geometricconfiguration and thickness suitable for use with the semiconductordevice 12.

[0030] The substrate 30 is formed having a plurality of thermal vias,such as thermal vias 42, 44, 46, 48, 50 and 52. The thermal vias areformed in a predetermined configuration and in sufficient quantity, suchas those illustrated in FIG. 2, to remove a predetermined amount of heatfrom the gap 16. More specifically, in FIG. 2, the substrate 30 is shownwith a plurality of thermal vias in a predetermined pattern or matrix54. The number of thermal vias formed is selected based on the amount ofheat, the nature of the circuit, the type of substrate, the type ofcircuitry on the substrate, and other such factors as known to those inthe art. The thermal vias may be formed in any desired configurationnecessary to effect transfer of heat from the semiconductor device 12and the connection thereof to the substrate 14 and, more particularly,the transfer of heat from the gap 16 to exterior the substrate 30.

[0031] As shown in FIG. 1, the thermal vias 42, 44, 46, 48, 50 and 52each may have a separate metallized interior 56. The metallized interior56 facilitates heat transfer from the interior surface 40, themetallized surface pattern of electrical circuits 28, and the gap 16 toexterior the substrate 14 of the semiconductor device assembly 10. Thatis, each of the thermal vias, such as thermal via 42, may have theinterior thereof metallized, as shown at 56, to facilitate heattransfer.

[0032] The thermal vias such as vias 42, 44, 46, 48, 50 and 52, as wellas those appearing in the matrix 54 illustrated in drawing FIG. 2,preferably are cylindrical in shape having a diameter from about a 0.001inches to about 0.010 inches. The thermal vias 42, 44, 46, 48, 50 and52, as well as those in the matrix 54, being formed by well knownacceptable techniques.

[0033] In reference to FIG. 1, solder bumps 34 and 36 may be formed fromvarious types of solder and various alloys thereof, conductive polymer,other materials known in the art such as gold, indium, silver, platinumand various alloys thereof, any one of which are selected to facilitateflow or reflow thereof to make the desired electrical interconnections.

[0034] Also, as shown in FIG. 1, a fill material 60, referred to as anunderfill material, is shown positioned in the gap 16 between thesemiconductor device 12 and the substrate 14. That is, the material 60is positioned to seal the second active interior surface 22 of thesemiconductor device 12, as well as the solder bumps 34 and 36 and themetallized surface pattern of electrical circuits 28. The fill materialmay be selected to enhance the mechanical bond between the semiconductordevice 12 and the substrate 14, to help distribute stress on thesemiconductor device 12 and the solder bumps 34 and 36, and to increasestructural rigidity and, in turn, facilitate longer life and reducedamage from physical shock to the semiconductor device assembly 10. Thefill material also helps protect the semiconductor device 12 andsubstrate 14 from contaminants, including moisture, chemicals, chemicalions, and the like.

[0035] The fill material 60 is typically a polymeric material, such asan epoxy or acrylic resin, that may contain various types of inertfillers. The fill material 60 is typically selected to have a thermalcoefficient of expansion that approximates that of the semiconductordevice 12 and/or the substrate 14 to help minimize the stress placed onthe semiconductor device assembly 10 and, more particularly, on thesemiconductor device 12 in relation to the substrate 14 in differingthermal conditions.

[0036] To promote filling the gap 16, the viscosity of the fill material60 is controlled and selected to facilitate the flow thereof to theinterior of the gap 16. That is, it is desirable for the fill material60 to easily, readily flow to fully fill the volume of the gap 16 whileminimizing voids, bubbles and non-uniform disposition of the fillmaterial in the gap 16.

[0037] For the semiconductor device assembly 10 of FIG. 1, a vacuum isprovided proximate the thermal vias in order to draw material in andaround the gap 16 to exterior the substrate 14. Thereby, the vacuumurges the fill material 60 from the gap perimeter 61 into the interiorof the gap 16 to uniformly dispose fill material 60 throughout the gap16. The perimeter 61 of the gap 16 being defined by the geometry of thesemiconductor device 12. As illustrated, in FIG. 1, the perimeterextends around all sides of the semiconductor device 12. If desired, thefill material may be provided about a portion of the perimeter 61,rather than the entire perimeter 61.

[0038] As illustrated in FIG. 1, apparatus may be provided to facilitateconstruction of the desired semiconductor device assembly 10. Asillustrate, the apparatus is shown in simplified form with a support 64,configured to receive and support a semiconductor device assembly 10thereon. For example, semiconductor device assembly 10 may be placed onthe support 64 and supported by a sealing device 68 to minimize leakageof fluids thereby, such as air. All or a portion of the thermal vias 42,44, 46, 48, 50 and 52 or, alternatively, at least a portion of thethermal vias of the matrix 54 shown in FIG. 2, are exposed or uncoveredand face into a vacuum chamber 66.

[0039] As here shown, the vacuum chamber 66 is formed by an exteriorwall 70 which may be domed, rectangular or in any convenient desiredshape.

[0040] The vacuum chamber 66 has an evacuation line 72 interconnectedthrough the wall 70. A vacuum valve 74 is interconnected in theevacuation line 72 to interconnect the chamber 66 with a vacuum source76.

[0041] The vacuum source 76 may be of any convenient type of industrialvacuum source. For instance, it may be a simple vacuum pump designed orconfigured to draw a vacuum (e.g., one or more atmospheres) tofacilitate the flow of the fill material 60 from the perimeter 61 to theinterior 63 of the gap 16 without imposing undesired stress on thesubstrate 30 and the semiconductor chip 12. However, a vacuum valve 74is provided and may be used to isolate the vacuum chamber 66 from thevacuum source 76. A bleed valve 78 is provided interconnected into theevacuation line 72 to allow the vacuum to be relieved therethrough.

[0042] It must be stated that the term “vacuum” as used herein, is usedto describe the removal of gas or other matter from the vacuum chamber66 to create a negative pressure; i.e., a pressure less than atmosphericpressure within the vacuum chamber 66.

[0043] A pressure chamber 80 is formed by a sidewall 82, which may be,if desired, connected to the sidewall 70 forming the vacuum chamber. Thesidewall 82 may be formed in any particular desired shape, includinghemispheric, rectilinear or the like, to create a chamber into which afluid pressure may be exerted as hereinafter described.

[0044] As illustrated in FIG. 1, the sidewall 82 of the pressure chamber80 is an extension of the sidewall 70 of the vacuum chamber 66 sinceboth may be unitarily formed with the support 64 thereby resulting inthe pressure chamber 80 and the vacuum chamber 66 all being a singlestructure. As illustrated, the pressure chamber 80 includes a lid 84,secured by a hinge 86, and held closed by a latch 81. When closed, thelid 84 is sealed by an o-ring 90. Other types of suitable sealconfigurations may be used to provide a sealing relationship for the lid84, as desired.

[0045] The lid 84 is sized to facilitate positioning and removal of asemiconductor device assembly 10 into and out of pressure chamber 80, asillustrated. With the lid 84 secured as illustrated in FIG. 1, pressuremay be supplied by a pressure source 92, such as a small compressor or asource of pressurized gas, through a pressure line 94 and a pressureisolation valve 96. Pressure, particularly using a suitable gas, is usedto provide a force 98 and 100 against the fill material 60 positionedproximate the perimeter 61 of the gap 16 to urge the fill material 60toward the interior 63 of the gap 16. Thus, it can be seen that adifferential pressure is created between the pressure force 98, 100applied in the pressure chamber 80 and the vacuum 62 drawn in theinterior 63 of the gap 16 through vias 46, 48 by way of the vacuumchamber 66. In view of the differential pressure, the applied vacuumpressure force urges the fill material 60 toward the interior 63 of thegap 16 is enhanced so that fill material may be selected to reduce cost,enhance strength, and facilitate complete filling of the gap 16.Further, the evacuation of the interior 63 of the gap 16 eliminates theneed to provide a way for trapped air to escape upon movement of fillmaterial 60 toward the interior 63. Also, it is believed that the use ofa vacuum to fill the gap 16 helps reduce the number of bubbles in thefill material 60 and helps provide a more uniform distribution of fillmaterial 60 in the gap 16.

[0046] In referring to the pressure chamber 80, it may be noted that ableed valve 106 is provided to vent the pressure that is built up to theinterior of the pressure chamber 80 upon operation of the pressuresource and positioning the valve 96 in the open position. That is, thepressure in chamber 80 may be relieved before opening the lid 84.

[0047] It may be noted that the valves 106, 96, 78 and 74 are here shownin simplified schematic form with an open circle representing a valve inan open position and with a circle having a cross through itrepresenting a valve in a closed position. Any suitable desired valvemay be used consistent with the pressures being used.

[0048] It may be noted that the source of pressure may provide air, gas,or any other suitable fluid to apply pressure. In practice, it may bedesired to use inert gas, including, for example, dry nitrogen.

[0049] Referring to drawing FIG. 3, to practice a method of making asemiconductor device assembly 10 using the disclosed apparatus, asemiconductor device 12 and a substrate 14, as shown in blocks 120 and122, are positioned relative to each other, as illustrated in FIG. 1.The semiconductor device 12 is connected at 124 to the substrate 14,preferably by reflowing the solder bumps 34 and 36. The substrate 14 andthe semiconductor device 12 are then supported on the support 64engaging sealing device 68. The semiconductor device 12 is connected tothe substrate 14 defining a gap 16 to be filled. On the perimeter 61 ofthe gap 16, a fill material 60 is positioned by a filling device 110, asillustrated in FIG. 1 to be a cylinder 112 with a piston 114 operable tourge fill material 116 outward through applicator tube 118. Otherstructures or devices may be used to position the fill material 60 aboutthe perimeter 61 as desired.

[0050] The fill material 60 is preferably positioned, as indicated at126, about the perimeter 61 prior to placement in the pressure chamber80 proximate the vacuum chamber 66. However, in some situations it maybe appropriate to apply the fill material after the semiconductor device12 and substrate 14 are connected and positioned on the support 64.

[0051] After positioning the semiconductor device 12 and substrate 14 asrepresented by blocks 120 and 122 on the support 64, when they areconnected as shown by block 124, thereafter, a vacuum 62 may be drawn128 in vacuum chamber 66 by operation of the valve 74, 78 and the vacuumsource 76. That is, the gas or air in the vacuum chamber 66 and in thegap 16 may be evacuated through the evacuation line 72 to create avacuum, pressure less than atmospheric pressure, within the vacuumchamber 66 and in the gap 16. Either simultaneously or sequentially, butpreferably substantially simultaneously, a pressure is applied 130 fromthe pressure source 92 through the pressure line 94 and valve 96 to thepressure chamber 80. The pressure applies a force illustrated in phantomby arrows 98 and 100, as illustrated in drawing FIG. 2, against the fillmaterial 60 to help urge the fill material towards the interior 63 ofthe gap 16. After the pressure force 98 and 100 has been applied and thevacuum 62 has been applied to the exterior surface 38 and, moreparticularly, through the thermal vias 42, 44, 46, 48, 50 and 52 to theinterior 63 of the gap 16, for a selected period of time determined byexperimentation for the selected fill material, the valves 74 and 96 areclosed and the vent valves 106 and 78 are opened to relieve the vacuum62 and to release the pressure within the respective vacuum chamber 66and pressure chamber 80 as illustrated by blocks 134 and 136.Thereafter, the lid 84 is opened and the semiconductor device assembly10 removed 136 therefrom.

[0052] While the present invention has been described in terms ofcertain methods, embodiments and apparatus, it should not be construedto be so limited. Those of ordinary skill in the art will readilyrecognize and appreciate that additions, deletions and modifications tothe embodiments described herein may be made without departing from thescope of the invention as hereinafter defined.

What is claimed is:
 1. Apparatus for filling a gap between a device anda substrate of an assembly, said apparatus including a supportingstructure for said assembly, said assembly having a substrate and asemiconductor device attached thereto, a perimeter extending around allsides of said semiconductor device, a gap between said semiconductordevice and said substrate, said semiconductor device having an activesurface facing said gap and an exterior surface, and said substratehaving a plurality of electrical circuits facing said gap and anexterior surface with a plurality of thermal vias formed between saidplurality of electrical circuits and said exterior surface with saidthermal vias in communication with said gap, said apparatus comprising:a fill apparatus for positioning fill material about said perimeter ofsaid gap, said fill apparatus having a source of fill material; apressure chamber positioned about said external surface of saidsemiconductor device applying a desired fluid pressure against said fillmaterial positioned about said perimeter with said desired fluidpressure against said fill material; and a vacuum chamber positionedabout said exterior surface of said substrate, said vacuum chamber beingconfigured to draw a vacuum through said plurality of thermal vias. 2.The apparatus of claim 1, wherein said pressure chamber includes apressure source connected to supply a fluid at a pressure thereto and tomaintain said fluid at a desired pressure.
 3. The apparatus of claim 1,wherein said vacuum chamber includes vacuum source connected to saidvacuum chamber to draw said vacuum and to maintain a selected vacuumpressure.
 4. The apparatus of claim 1, wherein said semiconductor deviceassembly comprises a semiconductor device and a substrate wherein saidsemiconductor device includes flip chip semiconductor device having asecond active surface having a plurality of bond pads thereon includinga connection structure and said substrate includes a substrate havingsaid electrical circuits on an interior surface for connection with saidconnection structure located on said plurality of bond pads forming anelectrical connection therewith.
 5. The apparatus of claim 1, whereinsaid semiconductor device assembly includes said substrate with saidplurality of said thermal vias, each via having a metallized interiorsurface therein.
 6. The apparatus of claim 1, wherein said fillapparatus contains said fill material including a filler therein. 7.Apparatus for filling the gap between a device and a substrate of anassembly, said apparatus having a supporting structure for supportingsaid assembly, said assembly having substrate and a semiconductor deviceattached thereto, a perimeter extending around all sides of saidsemiconductor device, a gap between said semiconductor device and saidsubstrate, said semiconductor device having an active surface facingsaid gap and an exterior surface, and said substrate having a pluralityof electrical circuits facing said gap and an exterior surface with aplurality of thermal vias formed between said plurality of electricalcircuits and said exterior surface with said thermal vias incommunication with said gap, said apparatus comprising: a fill apparatusfor positioning fill material about the perimeter of said gap, said fillapparatus containing fill material therein; a pressure chamberpositioned about said external surface of said semiconductor deviceapplying a desired fluid pressure against said fill material positionedabout said perimeter with said desired fluid pressure against said fillmaterial; and a vacuum chamber positioned about said exterior surface ofsaid substrate, said vacuum chamber being configured to draw a vacuumthrough said plurality of thermal vias.
 8. The apparatus of claim 7,wherein said pressure chamber includes a pressure source connected tosupply a fluid at a pressure thereto and to maintain said fluid at adesired pressure.
 9. The apparatus of claim 7, wherein said vacuumchamber includes vacuum source connected to said vacuum chamber to drawa vacuum and to maintain a selected vacuum pressure.
 10. The apparatusof claim 7, wherein said semiconductor device assembly comprises asemiconductor device and a substrate wherein said semiconductor deviceincludes flip chip semiconductor device having a second active surfacehaving a plurality of bond pads thereon including a connection structureand said substrate includes a substrate having said electrical circuitson the interior surface for connection with said connection structurelocated on said plurality of bond pads forming an electrical connectiontherewith.
 11. The apparatus of claim 7, wherein said semiconductordevice assembly includes said substrate with a plurality of said thermalvias, each via having a metallized interior surface therein.
 12. Theapparatus of claim 7, wherein said fill apparatus contains fill materialincluding a filler therein.